| 发明名称 |
LIFT-OFF STRUCTURE FOR SUBSTRATE OF A PHOTOELECTRIC DEVICE AND THE METHOD THEREOF |
| 摘要 |
The present invention related to a lift-off structure adapted to a substrate having a photoelectric device, the structure comprising: a buffer layer, forming on the substrate; an upper sacrificial layer, forming on the buffer layer; an etch stop layer, forming on the upper sacrificial layer, and the photoelectric device structure forming on the etch stop layer.
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| 申请公布号 |
US2012273815(A1) |
申请公布日期 |
2012.11.01 |
| 申请号 |
US201113273520 |
申请日期 |
2011.10.14 |
| 申请人 |
TSAI YU-LI;WU CHIH-HUNG;HO JEI-LI;HUANG CHAO-HUEI;YANG MIN-DE;INSTITUTE OF NUCLEAR ENERGY RESEARCH ATOMIC ENERGY COUNCIL, EXECUTIVE YUAN |
发明人 |
TSAI YU-LI;WU CHIH-HUNG;HO JEI-LI;HUANG CHAO-HUEI;YANG MIN-DE |
| 分类号 |
H01L33/30;H01L27/14;H01L31/18;H01L33/00 |
主分类号 |
H01L33/30 |
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