| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently determine whether abnormality exists in a portion contacting with a liquid in an exposure apparatus for performing exposure by an immersion method or not. <P>SOLUTION: An exposure method, for exposing a substrate P to exposure light EL through a projecting optical system PL and a liquid 1, comprises: a first step for optically observing a liquid contact portion contacting with the liquid 1 and storing obtained first image data; a second step for optically observing the liquid contact portion after contact with the liquid 1 of the liquid contact portion, e.g. after immersion exposure, to obtain second image data; and a third step for comparing the first image data with the second image data to determine existence of abnormality in an observation target portion. <P>COPYRIGHT: (C)2013,JPO&INPIT |
