| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminate structure in which a solution hardly influences a dielectric layer during a manufacturing step, and a manufacturing method thereof. <P>SOLUTION: A laminate structure comprises: a metallic base material 1; a dielectric layer 2; a protective film 4; and an electrode layer 5. The dielectric layer 2 is formed on a surface of the base material 1. The protective film 4 has corrosion resistance and/or humidity resistance and covers a surface of the dielectric layer 2. The electrode layer 5 is formed on a surface of the protective film 4. A manufacturing method the laminate structure comprises: a step (a); a step (b); and a step (c). The step (a) forms the dielectric layer 2 on the surface of the metallic base material 1. The step (b) covers an exposed surface of the dielectric layer 2 with the protective film 4 having the corrosion resistance and/or humidity resistance. The step (c) forms the electrode layer 5 on the surface of the protective film 4 using a wet process technique. <P>COPYRIGHT: (C)2013,JPO&INPIT |
