| 摘要 |
<p>In order to remove treatment liquid (21) from a planar material to be treated (10), which is transported in an assembly for wet-chemical treatment of the material to be treated (10), a retaining surface (4, 14) is provided for holding back the treatment liquid (21). The retaining surface (4, 14) is arranged relative to a transport path of the material to be treated (10) so that a gap (8, 18) remains between the retaining surface (4, 14) and a surface of the material to be treated (10) opposing the retaining surface (4, 14), when the material to be treated (10) is moved past the retaining surface (4, 14). The retaining surface (4, 14) may, for example, be provided as an offset portion of a peripheral surface of a roll (2, 3).</p> |
