发明名称 |
Monitor pattern of semiconductor device and method of manufacturing semiconductor device |
摘要 |
A plurality of diffused resistors and a plurality of wirings (resistive elements) are alternately disposed along a virtual line, and those diffused resistors and wirings are connected in series by contact vias. In the same wiring layer as that of the wirings, a dummy pattern is formed so as to surround a formation region of the wirings and the diffused resistors. A space between the dummy pattern and the wirings is set in accordance with, for example, a minimum space between wirings in a chip formation portion. |
申请公布号 |
US8298903(B2) |
申请公布日期 |
2012.10.30 |
申请号 |
US20100974462 |
申请日期 |
2010.12.21 |
申请人 |
TONE SACHIE;UNO HIROYUKI;TAKAHASHI NAOKI;NISHIDA NAOKI;FUJITSU SEMICONDUCTOR LIMITED |
发明人 |
TONE SACHIE;UNO HIROYUKI;TAKAHASHI NAOKI;NISHIDA NAOKI |
分类号 |
H01L21/20;H01L23/52;H01L21/3205;H01L23/544 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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