发明名称 DEPOSITION APPARATUS USING LINEAR EVAPORATING SOURCE
摘要 PURPOSE: A deposition apparatus using a linear evaporation source is provided to uniformly deposit a sublimate material on a substrate by spraying the sublimate material through a nozzle unit. CONSTITUTION: A deposition apparatus comprises an evaporation source(100), a receiving unit(200) which is formed in the evaporation source to inject a material to be deposited, diffusion units(300) which are connected to the receiving unit and bent multiple times, a nozzle unit(400) which sprays an evaporated material passed through the diffusion unit, a guide unit(500) which is formed at the end of the nozzle unit, and a cover(700) which is coupled to one side of the evaporation source and allowed to open and close.
申请公布号 KR20120118330(A) 申请公布日期 2012.10.26
申请号 KR20110035826 申请日期 2011.04.18
申请人 YS THERMTECH CO., LTD. 发明人 LEE, JAE GYOUNG;CHUNG, SANG HUN
分类号 C23C14/24 主分类号 C23C14/24
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