发明名称 |
SYSTEM AND METHOD FOR OPTICAL PROXIMITY CORRECTION OF A MODIFIED INTEGRATED CIRCUIT LAYOUT |
摘要 |
A system and method for modifying an integrated circuit (IC) layout includes performing a correction process, such as an optical proximity correction (OPC) process, only on regions within designated blocks that are defined around respective modified structures. An IC layout can be compared to a modified version of the IC layout to detect modified structures. One or more large blocks can then be defined around respective modified structures. A correction process can then be performed on only the one or more large blocks. Small blocks within respective large blocks can then be extracted from the modified IC layout and merged with the original IC layout to generate a final modified and corrected IC layout. |
申请公布号 |
US2012272195(A1) |
申请公布日期 |
2012.10.25 |
申请号 |
US201113091316 |
申请日期 |
2011.04.21 |
申请人 |
HSUAN CHUNGTE;LO CHAO-LUNG;YANG TIEN-CHU;YANG TAHONE;CHEN KUANG-CHAO;CHEN CHIEN HUNG;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
HSUAN CHUNGTE;LO CHAO-LUNG;YANG TIEN-CHU;YANG TAHONE;CHEN KUANG-CHAO;CHEN CHIEN HUNG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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