发明名称 ELECTROSTATIC LATENT IMAGE MEASURING METHOD AND ELECTROSTATIC LATENT IMAGE MEASURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To obtain an electrostatic latent image measuring method and an electrostatic latent image measuring device for suppressing an influence of field curvature to be generated in two-dimensional scan of an exposure beam, and correctly evaluating quality of an electrostatic latent image to be formed by the exposure beam. <P>SOLUTION: An electrostatic latent image measuring device includes: an electric charge particle irradiation device 10 which irradiates the surface of a photoreceptor 23 with an electric charge particle beam to charge the photoreceptor; an exposure optical system 22 which irradiates the surface of the charged photoreceptor 23 with a light flux from a light source to form an electrostatic latent image on the surface of the photoreceptor 23; and a detector 24 which detects a secondary electron to be generated from the charged photoreceptor, in which the exposure optical system 22 is constituted so as to irradiate the charged photoreceptor 23 with the light flux while scanning the photoreceptor 23 with the light flux in the two-dimensional direction by including an acoustic optical deflection element 103 which diffracts the light flux from the light source in one direction, and an optical deflector 105 which deflects the light flux in the direction perpendicular to the diffraction direction, and includes adjustment means for adjusting an inclination angle of the exposure optical system 22 so that an influence of field curvature becomes small according to deflection characteristics of the acoustic optical deflection element 103. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012208220(A) 申请公布日期 2012.10.25
申请号 JP20110072352 申请日期 2011.03.29
申请人 RICOH CO LTD 发明人 TANAKA HIROMASA;SUHARA HIROYUKI
分类号 G03G21/00;G02B26/10 主分类号 G03G21/00
代理机构 代理人
主权项
地址