| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective exposure mask or reticle capable of performing exposure and transfer accurately without causing light to be reflected from an area other than a circuit pattern area being an exposure target. <P>SOLUTION: A reflective mask blank is prepared in which a multilayer reflection film 12, a protection film 13, an absorption film, and a rear face conductive film are formed on a substrate 11. Next, a circuit pattern and an absorption film other than the area are selectively removed to form a circuit pattern and a light-shielding frame area. Next, the protection film 13 and the multilayer reflection film 12 are removed in the light-shielding frame area. In addition, a removal area having the same shape as the light-shielding frame area is formed in a part of the rear face conductive film at the opposite position of the substrate in the light-shielding frame area. <P>COPYRIGHT: (C)2013,JPO&INPIT |
