发明名称 MANUFACTURING METHOD OF LAMINATE HAVING PATTERNED METAL FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a laminate having a patterned metal film excellent in adhesion and in insulation properties between patterned metal films capable of easily performing plasma etching treatment of a plated layer. <P>SOLUTION: A manufacturing method of a laminate having a patterned metal film comprises: a plated layer formation step (A) of forming a plated layer 12 on a substrate; a catalyst imparting step of imparting a plating catalyst or its precursor to the plated layer; a plating step (B) of performing plating 14; a pattern formation step (C) of forming a patterned metal film 16 using an etching liquid after the plating step; an acid solution contact step of bringing a substrate having the patterned metal film into contact with an acid solution; and a plated layer removal step (D) of removing a plated layer of a region 30 in which the patterned metal film is not formed by performing plasma etching treatment. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012209387(A) 申请公布日期 2012.10.25
申请号 JP20110073113 申请日期 2011.03.29
申请人 FUJIFILM CORP 发明人 MATSUMURA SUEHIKO
分类号 H05K3/18;C23C18/20;H05K3/08 主分类号 H05K3/18
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