| 发明名称 |
Method for etching a BST layer |
| 摘要 |
<p>The invention concerns a method for etching a PVD deposited barium strontium titanate (BST) layer, wherein a non-ionic surfactant at a concentration between 0.1 and 1 percent is added to an acid etching solution.</p> |
| 申请公布号 |
EP2515327(A1) |
申请公布日期 |
2012.10.24 |
| 申请号 |
EP20110305473 |
申请日期 |
2011.04.20 |
| 申请人 |
STMICROELECTRONICS (TOURS) SAS;STMICROELECTRONICS SRL |
发明人 |
CARO, VINCENT;RODILOSSO, DAVIDE |
| 分类号 |
H01L21/311 |
主分类号 |
H01L21/311 |
| 代理机构 |
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