| 摘要 |
An apparatus for treating a liquid containing impurities may comprise: a filtering chamber for receiving liquid containing impurities, the filtering chamber containing granular media and configured to permit the granular media to interact with the liquid containing impurities, thereby removing impurities from the liquid to produce filtrate; a filtrate section in communication with the filtering chamber for receiving the filtrate, the filtrate section being in communication with a first outlet for outflow of the filtrate; a gas supplying system for delivering gas to the granular media in the filtering chamber for transport of a portion of the granular media to a granular media washer; and a reject section in communication with the granular media washer for receiving a reject mixture comprising liquid and impurities from the granular media washer. The reject section may be in communication with a second outlet for outflow of a portion of the reject mixture. |
