发明名称 |
Apparatus for efficient removal of halogen residues from etched substrates |
摘要 |
An apparatus for removing volatile residues from a substrate is provided. In one embodiment, an apparatus for removing halogen-containing residues from a substrate includes a chamber suitable for operating maintaining a vacuum therein and a heat module positioned to heat a substrate disposed in the chamber. The apparatus for removing halogen-containing residues from a substrate also includes at least one of A) a temperature controlled pedestal having a projection extending radially therefrom suitable for supporting the temperature control pedestal on a ledge of the chamber body, the projection thermally isolating the base from the chamber body; B) a pair of substrate holders that include two support flanges extending radially inward from an inner edge of an arc-shaped body, each support flange having a substrate support step that includes a sloped landing; or C) a domed window. |
申请公布号 |
US8293016(B2) |
申请公布日期 |
2012.10.23 |
申请号 |
US20090572786 |
申请日期 |
2009.10.02 |
申请人 |
BAHNG KENNETH J.;DAVIS MATTHEW F.;MOREY TRAVIS;CARDUCCI JAMES D.;APPLIED MATERIALS, INC. |
发明人 |
BAHNG KENNETH J.;DAVIS MATTHEW F.;MOREY TRAVIS;CARDUCCI JAMES D. |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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