发明名称 Linear electron source, evaporator using linear electron source, and applications of electron sources
摘要 A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.
申请公布号 US8294115(B2) 申请公布日期 2012.10.23
申请号 US20080272477 申请日期 2008.11.17
申请人 KLEMM GUENTER;HACKER VOLKER;LOTZ HANS-GEORG;APPLIED MATERIALS, INC. 发明人 KLEMM GUENTER;HACKER VOLKER;LOTZ HANS-GEORG
分类号 G21K1/08;H01J3/14;H01J3/26;H01J49/42 主分类号 G21K1/08
代理机构 代理人
主权项
地址