发明名称 |
Linear electron source, evaporator using linear electron source, and applications of electron sources |
摘要 |
A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing. |
申请公布号 |
US8294115(B2) |
申请公布日期 |
2012.10.23 |
申请号 |
US20080272477 |
申请日期 |
2008.11.17 |
申请人 |
KLEMM GUENTER;HACKER VOLKER;LOTZ HANS-GEORG;APPLIED MATERIALS, INC. |
发明人 |
KLEMM GUENTER;HACKER VOLKER;LOTZ HANS-GEORG |
分类号 |
G21K1/08;H01J3/14;H01J3/26;H01J49/42 |
主分类号 |
G21K1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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