| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a convenient method for producing monofluoromethane, by which monofluoromethane is produced with a high yield, which is suitable for producing high-purity monofluoromethane usable as an etching agent or a cleaning agent etc., in a thin film process of a semiconductor industry, and which is conducted with a simple apparatus and an easy operation. <P>SOLUTION: The method for producing high-purity monofluoromethane includes a step of making dimethyl sulfate and an alkali metal fluoride such as potassium fluoride react with each other in the presence of a solvent with polarity such as diglyme and sulfolane. <P>COPYRIGHT: (C)2013,JPO&INPIT |
