发明名称 SUBSTRATE SUPPORT DEVICE, AND DRYING DEVICE
摘要 This substrate support device (2) is provided with: a plurality of shaft units (21) which are positioned in parallel to one another and which are axially supported at both ends, and which can be rotated individually and can be immobilized; a plurality of support pins (22), the pins being provided so as to protrude in the circumferential direction of each of the shaft units (21), with one or more pins arranged in the axial direction to form pin rows in the axial direction, and by selecting the pin row at which the axial direction of said pins (22) in each shaft unit (21) is the same for each shaft unit (21), a plurality of support patterns for supporting substrates are formed, the tips of each of the pins (22) forming the support patterns and supporting substrates; and a control unit that controls the angle of rotation of each shaft unit (21) in order to form one of the support patterns.
申请公布号 WO2012141082(A1) 申请公布日期 2012.10.18
申请号 WO2012JP59457 申请日期 2012.04.06
申请人 SHARP KABUSHIKI KAISHA;NAKAMURA KENTA 发明人 NAKAMURA KENTA
分类号 H01L21/683;B65G49/06;F26B5/04;H01L21/027;H01L21/304 主分类号 H01L21/683
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