NOZZLE SUBSTRATE, METHOD FOR MANUFACTURING NOZZLE SUBSTRATE, DROPLET EJECTING HEAD AND DROPLET EJECTING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a nozzle substrate in which an inclined part of a nozzle hole is formed continuously to a vertical part and a nozzle substrate plane without interposing a step therebetween to optimize flow path property of the nozzle hole, thereby having stable ejection property.

SOLUTION: The method for manufacturing a nozzle substrate includes: subjecting a silicon substrate 41 to anisotropic dry etching from a side of one surface thereof to form a cylindrical hole 11d, and then forming an SiO2film 45 inside the cylindrical hole; and performing etching while charging up the SiO2film 45 from a surface on the opposite side to form a second nozzle hole 11b whose diameter is enlarged at a desired inclination angle relative to a first nozzle hole 11a, and a third nozzle hole 11c.

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