发明名称 |
PHOTOSENSITIVE ORGANIC PARTICLE |
摘要 |
[Problem] To provide a material whereby a photosensitive composition can be applied to a substrate and dried to form a photosensitive coating, and a pattern can be formed by exposure and development, and to provide a method for patterning the material. [Solution] A photosensitive composition comprising water-soluble organic particles and a solvent, the solvent being a poor solvent with respect to the water-soluble organic particles. The photosensitive composition is preferably configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, and a unit structure (C) for imparting dispersibility, and the composition further includes a photoacid generator. The photosensitive composition may alternatively be configured such that the water-soluble organic particles comprise a polymer containing a unit structure (A) for forming organic particles, a unit structure (B) for forming cross-linkages between particles, a unit structure (C) for imparting dispersibility, and a unit structure (D) having a photoacid generating group. The pattern formation method comprises the steps of applying the photosensitive composition to a substrate and drying the photosensitive composition to form a photosensitive coating, exposing the coating via a mask, and developing using a developing solution. |
申请公布号 |
WO2012141210(A1) |
申请公布日期 |
2012.10.18 |
申请号 |
WO2012JP59894 |
申请日期 |
2012.04.11 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD.;KISHIOKA, TAKAHIRO;UMEZAKI, MAKIKO;KIMURA, SHIGEO;NISHIMAKI, HIROKAZU;OHASHI, TOMOYA;USUI, YUKI |
发明人 |
KISHIOKA, TAKAHIRO;UMEZAKI, MAKIKO;KIMURA, SHIGEO;NISHIMAKI, HIROKAZU;OHASHI, TOMOYA;USUI, YUKI |
分类号 |
G03F7/038;C08F220/54;C08L101/00;G03F7/004 |
主分类号 |
G03F7/038 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|