MULTI-FREQUENCY HOLLOW CATHODE SYSTEM FOR SUBSTRATE PLASMA PROCESSING
摘要
A hollow cathode system is provided for plasma generation in substrate plasma processing. The system includes a plurality of electrically conductive plates stacked in a layered manner. Dielectric sheets are disposed between each adjacently positioned pair of the plurality of electrically conductive plates. A number of holes are each formed to extend through the plurality of electrically conductive plates and dielectric sheets. The system also includes at least two independently controllable radiofrequency (RF) power sources electrically connected to one or more of the plurality of electrically conductive plates. The RF power sources are independently controllable with regard to frequency and amplitude.
申请公布号
WO2012141863(A1)
申请公布日期
2012.10.18
申请号
WO2012US30072
申请日期
2012.03.22
申请人
LAM RESEARCH CORPORATION;HOLLAND, JOHN, PATRICK;VENTZEK, PETER, L. G.