| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a configuration for hand cleaning can be provided without causing any increase in the occupation area. <P>SOLUTION: The substrate processing apparatus comprises an indexer robot 11, a main transportation robot 12, a processing unit 6, a delivery unit 9, and a hand cleaning unit 15. The indexer robot 11 and the main transportation robot 12 have an indexer hand 20 to hold a substrate and a main transportation hand 30, respectively. The indexer robot 11 and the main transportation robot 12 deliver the substrate through the delivery unit 9. The hand cleaning unit 15 is disposed above or below the delivery unit 9, and cleans the indexer hand 20 and the main transportation hand 30. <P>COPYRIGHT: (C)2013,JPO&INPIT |
