发明名称 MAGNETIC DEFLECTION SYSTEM FOR ELECTRON BEAMS
摘要 <p>A vaporizing device is provided, wherein an elongated pot having material to be vaporized is impinged upon by an electron beam, preferably via several electron guns. Each electron gun is responsible for a certain section of the pot. The electron beam is guided over the melt in a pendular manner. For this purpose, a first magnetic deflecting unit is provided, which produces a variable parallel displacement of the electron beam. In order to achieve this, two magnetic fields are provided, the magnetic field boundaries of which form a type of lens system, wherein the outlet side of the first magnetic field is convex and the inlet side of the second magnetic field is concave. In order to deflect the electron beam into the pot, a second magnetic deflecting unit is provided, the magnetic field of which can be moved synchronously with the beam displacement parallel to the pot.</p>
申请公布号 EP2510535(A1) 申请公布日期 2012.10.17
申请号 EP20100814760 申请日期 2010.12.10
申请人 FERROTEC GMBH 发明人 ZINSSTAG, JUERGEN;JANS, CRISTIAN
分类号 H01J37/147;C23C14/30;C23C14/54;H01J37/305 主分类号 H01J37/147
代理机构 代理人
主权项
地址
您可能感兴趣的专利