COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, METHOD FOR PRODUCING SAME, AND COMPOSITION,申请号KR20067021671-传众专利搜索

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发明名称	COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, METHOD FOR PRODUCING SAME, AND COMPOSITION
摘要
申请公布号	KR101191687(B1)	申请公布日期	2012.10.16
申请号	KR20067021671	申请日期	2005.04.28
申请人		发明人
分类号	C08F216/02;C08F8/00;C08F212/04;C08F216/10;C08F220/26;G03F7/004;G03F7/039;G03F7/11	主分类号	C08F216/02
代理机构		代理人
主权项
地址

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