发明名称 Polishing liquid for metal and method of polishing
摘要 Disclosed is a metal-polishing liquid comprising: a metal-oxide-dissolving agent; a metal-oxidizing agent; a metal anticorrosive; a water-soluble polymer having a weight-average molecular weight of 8,000 or higher and having an anionic functional group and a nonionic functional group; and water, and having a pH within the range of 2.5 or higher but 5.0 or less. The metal-polishing liquid is effective in reducing the frictional force in polishing which generates during CMP. And is highly effective in flattening the surface of a work to be polished.
申请公布号 US8288282(B2) 申请公布日期 2012.10.16
申请号 US20080670292 申请日期 2008.07.28
申请人 NOMURA YUTAKA;FUKASAWA MASATO;NAKAGAWA HIROSHI;HITACHI CHEMICAL CO., LTD. 发明人 NOMURA YUTAKA;FUKASAWA MASATO;NAKAGAWA HIROSHI
分类号 C09K13/00 主分类号 C09K13/00
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