发明名称 |
Polishing liquid for metal and method of polishing |
摘要 |
Disclosed is a metal-polishing liquid comprising: a metal-oxide-dissolving agent; a metal-oxidizing agent; a metal anticorrosive; a water-soluble polymer having a weight-average molecular weight of 8,000 or higher and having an anionic functional group and a nonionic functional group; and water, and having a pH within the range of 2.5 or higher but 5.0 or less. The metal-polishing liquid is effective in reducing the frictional force in polishing which generates during CMP. And is highly effective in flattening the surface of a work to be polished. |
申请公布号 |
US8288282(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US20080670292 |
申请日期 |
2008.07.28 |
申请人 |
NOMURA YUTAKA;FUKASAWA MASATO;NAKAGAWA HIROSHI;HITACHI CHEMICAL CO., LTD. |
发明人 |
NOMURA YUTAKA;FUKASAWA MASATO;NAKAGAWA HIROSHI |
分类号 |
C09K13/00 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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