发明名称 Method for producing a semiconductor
摘要 A method for producing a semiconductor includes providing a p-doped semiconductor body having a first side and a second side; implanting protons into the semiconductor body via the first side to a target depth of the semiconductor body; bonding the first side of the semiconductor body to a carrier substrate; forming an n-doped zone in the semiconductor body by heating the semiconductor body such that a pn junction arises in the semiconductor body; and removing the second side of the semiconductor body at least as far as a space charge zone spanned at the pn junction.
申请公布号 US8288258(B2) 申请公布日期 2012.10.16
申请号 US20100769976 申请日期 2010.04.29
申请人 MAUDER ANTON;SCHULZE HANS-JOACHIM;STRACK HELMUT;TIMME HANS-JOERG;WERNER WOLFGANG;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 MAUDER ANTON;SCHULZE HANS-JOACHIM;STRACK HELMUT;TIMME HANS-JOERG;WERNER WOLFGANG
分类号 H01L21/306 主分类号 H01L21/306
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