| 摘要 |
PURPOSE: A cleaning apparatus for a mixed mode semiconductor device is provided to prevent secondary pollution of a wafer by consecutively performing wet cleaning and dry cleaning processes within one apparatus. CONSTITUTION: Dry chambers(301) and wet chambers(400) are arranged in a cleaning unit(203). The dry chambers clean wafers under vacuum conditions with different method. The wet chambers clean the wafers using a mixed cleansing material. A transport unit(600) transfers the wafers which are placed in a standby unit to the wet chambers and the dry chambers by receiving an electric signal from outside. A cleaning control module(700) selectively provides the mixed cleansing material of the wet chamber according to a job file.
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