| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of operating a vacuum coating device, with no degradation in efficiency of a deposition process. <P>SOLUTION: In a phase I, after a coating chamber 11 is cleaned in a gas containing fluorine, a residue 13 sticks to a chamber wall. In phase II, a deposition step is performed using a PECVD method with no substrate, so that a diffusion prevention layer 15 is formed on the entire inner wall of the coating chamber 11. The diffusion prevention layer 15 covers all the residue 13 remaining in the phase I, to prevent the residue 13 from diffused in the chamber. In phase III, a substrate 17 for manufacturing a solar cell is arranged in the coating chamber 11 that is entirely covered with the diffusion prevention layer 15, and a conventional coating step is started. After a layer containing Si is precipitated once or a plurality of times, a cleaning step using the gas containing fluorine is performed again. At that time, the diffusion prevention layer 15 is removed to attain an initial state (phase I). <P>COPYRIGHT: (C)2013,JPO&INPIT |
