发明名称 MATERIALS FOR IMPRINT LITHOGRAPHY
摘要 <P>PROBLEM TO BE SOLVED: To prevent a relief pattern recorded in a solidified polymeric material from being distorted during separation of an imprint template from a substrate, by resolving issues, so-called release characteristics, that first the solidified polymeric material ought to adhere well to a transfer layer on the substrate, and second, it ought to be easily released from a surface of the imprint template. <P>SOLUTION: An imprinting material contains a fluorinated surfactant, a photoinitiator, and a monomer selected from a monomer group consisting of acrylates and methacrylates. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012195610(A) 申请公布日期 2012.10.11
申请号 JP20120139488 申请日期 2012.06.21
申请人 MOLECULAR IMPRINTS INC;BOARD OF REGENTS THE UNIV OF TEXAS SYSTEM 发明人 XU FRANK Y;WATTS MICHAEL P C;STACEY NICHOLAS A
分类号 H01L21/027;C08F2/48;C08F20/00;C08J7/16;C08J7/18;C08K3/00;C08K5/54;C08K5/541;C09D11/10 主分类号 H01L21/027
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