| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide various configurations of a projection system, a lithographic apparatus, and a device manufacturing method. <P>SOLUTION: According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gas environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gas environment which is substantially isolated from the external gas environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gas environment in response to a change in pressure in the external gas environment or a pressure difference between the internal gas environment and the external gas environment. <P>COPYRIGHT: (C)2013,JPO&INPIT |
