| 发明名称 |
SEMICONDUCTOR DEVICE EXHIBITING REDUCED PARASITICS AND METHOD FOR MAKING SAME |
| 摘要 |
A semiconductor device includes a substrate and a gate stack disposed on the substrate. An upper layer of the gate stack is a metal gate conductor and a lower layer of the gate stack is a gate dielectric. A gate contact is in direct contact with the metal gate conductor.
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| 申请公布号 |
US2012256277(A1) |
申请公布日期 |
2012.10.11 |
| 申请号 |
US201113083893 |
申请日期 |
2011.04.11 |
| 申请人 |
DORIS BRUCE B.;CHENG KANGGUO;WONG KEITH KWONG HON |
发明人 |
DORIS BRUCE B.;CHENG KANGGUO;WONG KEITH KWONG HON |
| 分类号 |
H01L29/772;H01L21/28 |
主分类号 |
H01L29/772 |
| 代理机构 |
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