| 摘要 |
PURPOSE: A device and a method for inspecting a substrate in which a pattern layer is formed are provided to inspect patterns at an ultra-precise resolution having a contrast more than twice. CONSTITUTION: A method for inspecting a substrate in which a pattern layer is formed is as follows. First wavelength lights are irradiated on a substrate(110) in which a pattern layer(120) is formed. First wavelengths penetrate the substrate but not the pattern layer. The first wavelength lights have penetrated the substrate are detected. An indium tin oxide is coated on the substrate so that the pattern layer is formed.
|
