| 摘要 |
PURPOSE: A plasma processing apparatus is provided to prevent arc by estimating arc generation and controlling a RF power supply unit. CONSTITUTION: A chamber(110) has a plasma processing space. A power supply unit(150) has an arc generation preventing algorithm which prevents arc in the chamber by controlling power provided to the chamber. A matching unit(120) is formed between the power supply unit and the chamber in order to match the impedance of the chamber. An arc sensing unit(130) compares a signal value with a preset tolerance range by measuring the signal value of an output terminal in the matching unit. The arc sensing unit estimates arc generation through a comparison result. The arc sensing unit prevents arc generation by running the arc generation preventing algorithm. [Reference numerals] (120) Matching unit; (130) Arc sensing unit; (140) Control unit; (150) Power supply unit; (151) Arc prevention algorithm |
