发明名称 |
Method for fabricating an image sensor device |
摘要 |
A method for fabricating an image sensor device is disclosed. The method for fabricating an image sensor device comprises forming a photosensitive layer on a substrate. The photosensitive layer is exposed through a first photomask to form an exposed portion and an unexposed portion. The unexposed portion is partially exposed through a second photomask to form a trimmed part, wherein the second photomask comprise a first segment and a second segment that has a transmittance greater than that of the first segment. The trimmed part is removed to form photosensitive structures. The photosensitive structures are reflowed to form a first microlens and a second microlens having different heights. |
申请公布号 |
US8283110(B2) |
申请公布日期 |
2012.10.09 |
申请号 |
US20100816743 |
申请日期 |
2010.06.16 |
申请人 |
YANG MING-SHENG;YU YA-YUN;VISERA TECHNOLOGIES COMPANY LIMITED |
发明人 |
YANG MING-SHENG;YU YA-YUN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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