发明名称 MOS device with low injection diode
摘要 A semiconductor device is formed on a semiconductor substrate. The device includes a drain, an epitaxial layer overlaying the drain, and an active region. The active region includes a body disposed in the epitaxial layer, having a body top surface, a source embedded in the body, extending from the body top surface into the body, a gate trench extending into the epitaxial layer, a gate disposed in the gate trench, an active region contact trench extending through the source and into the body, an active region contact electrode disposed within the active region contact trench, wherein a thin layer of body region separating the active region contact electrode from the drain.
申请公布号 US8283723(B2) 申请公布日期 2012.10.09
申请号 US20070005130 申请日期 2007.12.21
申请人 BHALLA ANUP;WANG XIAOBIN;PAN JI;WEI SUNG-PO;ALPHA & OMEGA SEMICONDUCTOR LIMITED 发明人 BHALLA ANUP;WANG XIAOBIN;PAN JI;WEI SUNG-PO
分类号 H01L29/66 主分类号 H01L29/66
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