| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT |
| 摘要 |
<p>A positive photosensitive resin composition including: (a) a resin capable of being dissolved in an aqueous alkaline solution; (b) a compound having two or more oxetanyl groups; (c) a diazonaphthoquinone compound; and (d) a solvent.</p> |
| 申请公布号 |
KR20120109528(A) |
申请公布日期 |
2012.10.08 |
| 申请号 |
KR20127016708 |
申请日期 |
2011.01.18 |
| 申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. |
发明人 |
KOTANI MASASHI;OOE MASAYUKI;KONNO TAKU;MINEGISHI TOMONORI;ONO KEISHI |
| 分类号 |
G03F7/023;G03F7/004;H01L21/027 |
主分类号 |
G03F7/023 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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