| 摘要 |
PURPOSE: A treatment apparatus of harmful gas using plasma is provided to effectively treat harmful gas without high power and high voltages and to facilitate the initiation of plasma. CONSTITUTION: A treatment apparatus of harmful gas using plasma includes a gas supplying part(10) and a plasma reactor(20). The plasma reactor includes a gas reacting path(30), a pair of discharging electrodes(41, 42), a pair of conductive plasma advancing electrodes(51, 52). The gas reacting path includes a gas inlet(31) and a gas outlet(32). The discharging electrodes are protruded from both walls(33, 34) of the gas reacting path to face each other. The plasma advancing electrodes are installed at the rear sides of the discharging electrodes along the flowing direction of target gas and backwardly advances plasma generated from the discharging electrodes. [Reference numerals] (10) Gas supplying part; (AA) Bad odor harmful gas; (BB) Clean gas
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