| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique advantageous for determining an exposure condition in an exposure device. <P>SOLUTION: A program executes: a first step of selecting an interest evaluation item for comparing an image formed on an image surface of a projection optical system corresponding to an exposure condition with a target pattern to be formed on a substrate and evaluating it; a second step of selecting, as an auxiliary evaluation item, an evaluation item which is different from the interest evaluation item and whose value changes in the same direction as the changing direction of the value of the interest evaluation item when the exposure condition is changed; a third step of setting an evaluation function which is the function of the interest evaluation item and the auxiliary evaluation item; a fourth step of calculating the values of the evaluation function so as to bring the value of the evaluation function close to a target value; and a fifth step of determining a value of a parameter corresponding to the value of the evaluation function satisfying the target value from the plurality of values of the evaluation function calculated in the fourth step as a value of the parameter of the exposure condition. <P>COPYRIGHT: (C)2013,JPO&INPIT |
