COMPOSITION FOR FORMING PATTERN REVERSAL FILM, AND METHOD FOR FORMING REVERSAL PATTERN

摘要

[Problem] To provide a composition for forming a pattern reversal film, which contains silicon atoms and can be reworked by means of an organic solvent that is usually used for removal of resist patterns. [Solution] A composition for forming a pattern reversal film, which contains a polysiloxane, an additive and an organic solvent. The composition is characterized in that the polysiloxane has a structural unit represented by formula (1) and a structural unit represented by formula (2) and that the additive is an organic acid that contains at least two carboxyl groups and/or hydroxyl groups. A pattern reversal film using the composition, and a method for forming a reversal pattern. (In formula (1), R1 represents an alkyl group having 1-8 carbon atoms.) (In formula (2), R2 represents an acryloyloxy group or a methacryloyloxy group, and n represents an integer of 2-4.)