| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for evaluating, without pattern formation, performance of a copolymer for lithography in pattern formation. <P>SOLUTION: Provided is an evaluation method of a copolymer for lithography including following steps of (1) to (3): (1) a step of forming a thin film on a substrate using a lithography composition including a copolymer for lithography and a compound which generates an acid upon irradiation with actinic rays or radiation, (2) a step in which after exposure of the thin film, development is performed, and (3) a step in which after the development, the surface condition of the thin film having undergone development processing is evaluated. <P>COPYRIGHT: (C)2013,JPO&INPIT |
