发明名称 |
Stylus system for modifying small structures |
摘要 |
An improved method for rapidly and accurately modifying small structures, including structures on a micron or nanometer scale, suitable for the repair of defects in lithographic photo-masks and semiconductors on a nano-scopic level. Features or samples repaired may be conductive or non-conductive. A single instrument can be employed to both observe the surface of the mask or wafer, and to effectuate the repair of conductive and non-conductive features thereon. Using a Stylus-Nano-Profilometer probe, rapid lateral strokes across the sample surface in a definable pattern at known high applied pressure are used to effectuate defect repair. The tip of the probe can also be dithered rapidly in a pattern or used as to create a jackhammer effect to more effectively remove material from the sample surface. |
申请公布号 |
EP1587113(B1) |
申请公布日期 |
2012.10.03 |
申请号 |
EP20050075824 |
申请日期 |
2005.04.11 |
申请人 |
FEI COMPANY |
发明人 |
LINDER, ROBERT;KNEEDLER, ERIC |
分类号 |
G01Q70/00;B82B3/00;B82Y35/00;G01Q10/00;G01Q80/00;G03F1/00;G03F1/72;H01L21/00;H01L21/027 |
主分类号 |
G01Q70/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|