发明名称 |
Vacuum processing apparatus and method, and storage medium for executing the method |
摘要 |
A vacuum processing apparatus transfers a wafer between a first transfer arm and a second transfer arm via a rotary stage; acquires position data of a peripheral portion of the wafer by using a line sensor while rotating the rotary stage sustaining the wafer before a vacuum process thereon; calculates a center position and a direction of the wafer based on the position data; controls a rotation of the rotary stage to adjust the direction of the wafer based on the calculation result; and controls the second transfer arm such that the second transfer arm conveys the wafer to a wafer mounting member inside a vacuum processing chamber while allowing a center of the wafer to be aligned to a center of the mounting member based on the calculation result. |
申请公布号 |
US8280545(B2) |
申请公布日期 |
2012.10.02 |
申请号 |
US20080025326 |
申请日期 |
2008.02.04 |
申请人 |
KONDOH KEISUKE;TOKYO ELECTRON LIMITED |
发明人 |
KONDOH KEISUKE |
分类号 |
G06F7/00 |
主分类号 |
G06F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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