发明名称 Vacuum processing apparatus and method, and storage medium for executing the method
摘要 A vacuum processing apparatus transfers a wafer between a first transfer arm and a second transfer arm via a rotary stage; acquires position data of a peripheral portion of the wafer by using a line sensor while rotating the rotary stage sustaining the wafer before a vacuum process thereon; calculates a center position and a direction of the wafer based on the position data; controls a rotation of the rotary stage to adjust the direction of the wafer based on the calculation result; and controls the second transfer arm such that the second transfer arm conveys the wafer to a wafer mounting member inside a vacuum processing chamber while allowing a center of the wafer to be aligned to a center of the mounting member based on the calculation result.
申请公布号 US8280545(B2) 申请公布日期 2012.10.02
申请号 US20080025326 申请日期 2008.02.04
申请人 KONDOH KEISUKE;TOKYO ELECTRON LIMITED 发明人 KONDOH KEISUKE
分类号 G06F7/00 主分类号 G06F7/00
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