发明名称 Partitioning features of a single IC layer onto multiple photolithographic masks
摘要 One embodiment relates to a computer method of providing an electronic mask set for an integrated circuit (IC) layer. In the method, a first electronic mask is generated for the IC layer. The first electronic mask includes a first series of longitudinal segments from the IC layer, where the first series has fewer than all of the longitudinal segments in the IC layer. A second electronic mask is also generated for the IC layer. The second electronic mask includes a second series of longitudinal segments from the IC layer, where the second series has fewer than all of the longitudinal segments in the IC layer and differs from the first series. The first and second masks are generated so a coupling segment extends traverse to the first direction and couples one longitudinal segment on the IC layer to another longitudinal segment on the IC layer.
申请公布号 US8281262(B2) 申请公布日期 2012.10.02
申请号 US20090630330 申请日期 2009.12.03
申请人 ATON THOMAS J.;TEXAS INSTRUMENTS INCORPORATED 发明人 ATON THOMAS J.
分类号 G06F17/50 主分类号 G06F17/50
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