发明名称 PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS
摘要 A nozzle N which moves in a scan direction Ds along a surface Wf of a substrate W discharges an application liquid which contains a photo-curing material, and a light emitter E moving as if to follow the nozzle N irradiates light (UV light for instance) upon the application liquid. Arriving at an application end position, the nozzle N stops discharging the application liquid and retracts in a direction away from the substrate surface Wf. Meanwhile, the light emitter E keeps moving in the scan direction Ds, thereby irradiating even the terminating end of the application liquid with the light without fail.
申请公布号 US2012242008(A1) 申请公布日期 2012.09.27
申请号 US201213349291 申请日期 2012.01.12
申请人 IWASHIMA MASANOBU;SANADA MASAKAZU;DAINIPPON SCREEN MFG. CO., LTD. 发明人 IWASHIMA MASANOBU;SANADA MASAKAZU
分类号 B29C35/08 主分类号 B29C35/08
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