发明名称 PHOTO ACTIVE LAYER BY SILICON QUANTUM DOT AND THE FABRICATION METHOD THEREOF
摘要 Provided is a photo active layer for a solar cell or a light emitting diode and a fabricating method thereof. The photo active layer is formed by alternately stacking silicon quantum dot layers in which a plurality of silicon quantum dots containing conductive type impurities are formed in a medium, which is a silicon compound, and conductive layers, which are polycrystalline silicon layers, containing the same conductive type impurities as those of the silicon quantum dots.
申请公布号 WO2012128564(A2) 申请公布日期 2012.09.27
申请号 WO2012KR02060 申请日期 2012.03.22
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE;KIM, KYUNG JOONG;HONG, SEUNG HUI;PARK, JAE HEE;JANG, JONG SHIK 发明人 KIM, KYUNG JOONG;HONG, SEUNG HUI;PARK, JAE HEE;JANG, JONG SHIK
分类号 H01L31/042;H01L31/18;H01L33/04 主分类号 H01L31/042
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