THERMAL MANAGEMENT SYSTEMS, ASSEMBLIES AND METHODS FOR GRAZING INCIDENCE COLLECTORS FOR EUV LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications.

SOLUTION: A GIC cooling assembly 150 includes a GIC mirror shell 110 interfaced with a jacket 160 to form a sealed chamber 180. An open-cell heat transfer (OCHT) material 202 is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell 110 and the jacket. A coolant 170 is flowed in an azimuthally symmetric fashion through the OCHT material 202 between input and output plenums to effectuate cooling when the GIC cooling assembly 150 is adopted in a GIC mirror system configured to receive EUV from an EUV source to form collected EUV.

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