发明名称 FLOATING GATE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR PRODUCING SUCH DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a floating gate device with good data retention and electrical performance capable of downsizing NAND flash memory devices electrically and physically. <P>SOLUTION: The present invention is related to a method for producing a floating gate memory device, wherein a semiconductor-on-insulator substrate is provided, formed of a base substrate 100, a buried insulation layer, and a monocrystalline semiconductor top layer. Trenches are made in the substrate, to form elevated fin-shaped structures 111-114 having a monocrystalline top portion that acts as the floating gate. Parts of the buried insulation layer act as a tunnel oxide layer 101' of the floating gate devices. A gate dielectric layer 160 is formed on the side walls of the monocrystalline top portions by thermal oxidation, allowing low thickness of the gate dielectric layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012186474(A) 申请公布日期 2012.09.27
申请号 JP20120046149 申请日期 2012.03.02
申请人 IMEC 发明人 BLOMME PIETER;ANTONINO CACCIATO;GOURI SANKAR KAR
分类号 H01L27/115;H01L21/28;H01L21/336;H01L21/8247;H01L29/41;H01L29/423;H01L29/49;H01L29/788;H01L29/792 主分类号 H01L27/115
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