发明名称 |
EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD |
摘要 |
An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis.
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申请公布号 |
US2012241649(A1) |
申请公布日期 |
2012.09.27 |
申请号 |
US201213417789 |
申请日期 |
2012.03.12 |
申请人 |
NISHIHARA KATSUNOBU;SUNAHARA ATSUSHI;WAKABAYASHI OSAMU;OSAKA UNIVERSITY;GIGAPHOTON INC;INSTITUTE FOR LASER TECHNOLOGY |
发明人 |
NISHIHARA KATSUNOBU;SUNAHARA ATSUSHI;WAKABAYASHI OSAMU |
分类号 |
G21K5/00 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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