| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition that can obtain a resist pattern having excellent line edge roughness (LER). <P>SOLUTION: There is provided a resist composition comprising a resin having a structural unit represented by formula (aa), an acid generator and a cyclic ketone solvent. In the formula, R<SP POS="POST">aa1</SP>represents a hydrogen atom or a methyl group; R<SP POS="POST">aa2</SP>represents a 1-18C aliphatic hydrocarbon group which may have a substituent, in which a methylene group constituting the aliphatic hydrocarbon group may be substituted with an oxygen atom or a carbonyl group; and A<SP POS="POST">aa1</SP>represents a 1-6C alkanediyl group or a group represented by formula (a-1) which may have a substituent. <P>COPYRIGHT: (C)2012,JPO&INPIT |
