| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition and a method for formation of a resist pattern using the positive resist composition. <P>SOLUTION: The positive resist composition comprises a resin component (A) whose alkali solubility can be increased by the action of an acid and an acid generator component (B) which can generate an acid upon being exposed to light, wherein the resin component (A) comprises a polymer (A2) having a constituent unit (a1) represented by general formula (II). <P>COPYRIGHT: (C)2008,JPO&INPIT |
