发明名称 WAFER ALIGNING APPARATUS AND THE METHOD
摘要 PURPOSE: An apparatus and a method for aligning a wafer are provided to accurately align the wafer by correctly checking the position of the wafer using an ATM(Atmosphere Transfer Module) robot. CONSTITUTION: A VTM(Vacuum Transfer Module) robot(110) places a wafer on a stage(130) of a load lock chamber. A sensor measures barycentric coordinates of the wafer. A VTM controller transmits the barycentric coordinates of the wafer to an ATM. An ATM controller controls the wafer placed on the stage of the load lock chamber. An ATM robot(120) picks the wafer placed on the stage of the load lock chamber and places the wafer on an FOUP(Front Opening Unified Pod) by using the barycentric coordinates of the wafer..
申请公布号 KR20120106296(A) 申请公布日期 2012.09.26
申请号 KR20110024326 申请日期 2011.03.18
申请人 CYMECHS INC. 发明人 KIM, KYUNG BUM;CHO, YONG SEOK
分类号 H01L21/68 主分类号 H01L21/68
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