发明名称 |
Method for film formation, apparatus for film formation, and computer-readable recording medium |
摘要 |
Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate. |
申请公布号 |
US8273409(B2) |
申请公布日期 |
2012.09.25 |
申请号 |
US201113158180 |
申请日期 |
2011.06.10 |
申请人 |
HARA MASAMICHI;MIZUSAWA YASUSHI;TAGA SATOSHI;GOMI ATSUSHI;HATANO TATSUO;TOKYO ELECTRON LIMITED |
发明人 |
HARA MASAMICHI;MIZUSAWA YASUSHI;TAGA SATOSHI;GOMI ATSUSHI;HATANO TATSUO |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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