发明名称 Method for film formation, apparatus for film formation, and computer-readable recording medium
摘要 Disclosed is a method for film formation, characterized by comprising allowing a treatment gas stream containing a metal carbonyl-containing treatment gas and a carbon monoxide-containing carrier gas to flow into a region on the upper outside of the outer periphery of a substrate to be treated in a diameter direction of the substrate while avoiding the surface of the substrate and diffusing the metal carbonyl from the treatment gas stream into the surface of the substrate to form a metal film on the surface of the substrate.
申请公布号 US8273409(B2) 申请公布日期 2012.09.25
申请号 US201113158180 申请日期 2011.06.10
申请人 HARA MASAMICHI;MIZUSAWA YASUSHI;TAGA SATOSHI;GOMI ATSUSHI;HATANO TATSUO;TOKYO ELECTRON LIMITED 发明人 HARA MASAMICHI;MIZUSAWA YASUSHI;TAGA SATOSHI;GOMI ATSUSHI;HATANO TATSUO
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
主权项
地址